Tube Furnace - Oxidation Tube
The Multi-Zone Tube Furnace is a Lindberg Hevi-Duty Lancer M-300 that has been extensively upgraded and computerized. Each tube has MFC gas flow controls and is computer controlled with LabView V8.0 software. Each tube is specifically operated for one of the following capabilities: annealing, oxidation, phosphorus doping, and boron doping. The gases available in this system are Nitrogen, Argon, Oxygen and forming gas. The maximum wafer size for each of the tubes is 4 inches.
Oxidation tube: max Temp 1200°C. Used for growing thermal oxide films on Silicon. No metals or other materials allowed.