Molecular Vapor Deposition (MVD) System


The Applied MicroStructures, Inc. Molecular Vapor Deposition tool currently has water, FDTS (heptadecafluoro tetra hydrodecyl-trichlorosilane), and HMDS (Hexamethyldisilazane) materials that can be deposited. FDTS is hydrophobic (CA ~105°) and HMDS is hydrophilic (CA ~70°). FDTS is typically used as an anti-stiction coating. HMDS is typically used as a PR adhesion promoter. The chamber is set to 50 C but can range from 25 C to 60 C, the vapor lines are set to 100 C but can range from 40 C to 100 C, and the source silanes can also be heated.

This tool is also capable of producing a water plasma.

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